To fully unlock the potential of the upcoming era of Atomic Layer Deposition (ALD) research, it is crucial to incorporate the viewpoints of academia, industry, and governmental organisations, and ensure that these insights are promptly reflected in the academic articles.
To address this demand and bridge the gap between industry and scientific advances, Ultimaterials BV: a Netherlands-based company developing products in the domain of rechargeable batteries, nanotechnology and composite materials, run by scientists of diverse backgrounds, such as physics, chemistry and mechanical engineering – recently launched the new diamond open-access, peer-reviewed Atomic Layer Deposition International Journal.
Powered by Pensoft’s publishing platform ARPHA, the new academic outlet is dedicated to the latest research and developments in the field of atomic layer deposition.
Atomic Layer Deposition is targeting scientists specialising in all aspects of ALD and related alternating vapour phase technologies. Pensoft’s publishing platform ARPHA enables the journal to publish a range of scholarly content, such as original research articles, reviews, short communications, and method papers.
The system is tailored to assist the authors and the editors throughout the entire manuscript submission, review, and publication process, delivering an end-to-end experience and resulting in the publication of articles, enriched with data and multimedia content.
In addition to streamlining the editorial management and publication process, Atomic Layer Deposition can now enjoy improved visibility for its published articles: every article is published in multiple formats, including convenient PDF, semantically-enriched HTML and fully data-minable XML. Thanks to its advanced features and integration with major indexing services, it’s not only simpler to cite and reuse the published research, but the articles are also more readily discoverable and accessible to researchers and decision-makers across the globe.
Atomic Layer Deposition publishes papers in atomic and molecular layer deposition, area selective and spatial ALD, vapour phase infiltration, atomic layer etching, new developments in ALD process design, precursors and chemistry, applications, and characterization and analysis of films and coatings.
Thanks to the generous sponsorship of Ultimaterials B.V., the journal is not only free-to-read, but also free-to-publish, thereby ensuring that the latest research in ALD is available to a global audience to access, but also to produce and disseminate efficiently.
Submissions that report on innovative research, offer new insights or techniques, and contribute to advancing the state-of-the-art in the field from authors working in academic, industrial, and government research settings are especially welcome in Atomic Layer Deposition.
“Publishing a peer reviewed journal is quite a complicated endeavour. The peer review software, website hosting, production, layout, proofreading, publication in HTML, XML and PDF, indexing and archiving are fortunately all taken care of by the ARPHA Platform and the skilled team at Pensoft. We are glad that the Atomic Layer Deposition journal has found a home with a solid publishing foundation,”comments the founder of the journal and CEO of Ultimaterials B.V., Dr DJ Monsma.
“We are thrilled to welcome the Atomic Layer Deposition International Journal to our expanding portfolio of scholarly journals published on ARPHA Platform. We are confident that this important and particularly promising industry is being met with increasing enthusiasm. This positive trend is also seen in the appreciation and popularity of this novel journal among professionals in the field”,says Prof. Lyubomir Penev, CEO and founder of Pensoft and ARPHA.
The first papers of 2023 are already available online on the new website of Atomic Layer Deposition.
Within the pioneering papers published, there is a research article by US scholars that discusses the use of ALD for the fabrication of efficient and stable catalysts for the oxygen evolution reaction in water splitting for renewable energy applications.
Another study by a Dutch team reports the development of a world-first low-temperature atmospheric-pressure spatial ALD process for SiNx, which can reach comparably low oxygen atomic percentages as those obtained by low-pressure temporal ALD processes based on similar chemistries.
The Atomic Layer Deposition journal is also on social media. You can follow the ALD journal on Twitter and Linkedin.
About Ultimaterials B.V.:
Ultimaterials B.V. consists of scientists with background in physics, chemistry and mechanical engineering, and talented business administrators. Products developed by Ultimaterials B.V. are in the domain of rechargeable batteries, nanotechnology and composite materials. Apart from developing products with improved functionality and longevity, Ultimaterials BV also provides consulting services for venture fund enterprises and investments in the energy sector and materials science.
ARPHA is the first end-to-end, narrative- and data-integrated publishing solution that supports the full life cycle of a manuscript, from authoring to reviewing, publishing and dissemination. ARPHA provides accomplished and streamlined production workflows that can be customized according to the journal’s needs. The platform enables a variety of publishing models through a number of options for branding, production and revenue models to choose from.
Pensoft is an independent, open-access publisher and technology provider, best known for its biodiversity journals, including ZooKeys, Biodiversity Data Journal, Phytokeys, Mycokeys, One Ecosystem, Metabarcoding and Metagenomics and many others.
To date, the company has continuously been working on various tools and workflows designed to facilitate biodiversity data findability, accessibility, discoverability and interoperability. The latest large projects, led by Pensoft include the OpenBiodiv knowledge graph and the Horizon 2020 project BiCIKL.
Prof. Lyubomir Penev, founder and CEO at ARPHA and Pensoft
Dr DJ Monsma, founder of the Atomic Layer Deposition International Journal and CEO of Ultimaterials B.V.